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سالهفتهIDTitleApplNoIPCApplicantSubgroupزیر گروهرشته شرحDescription
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202548WO/2025/242393VIBRATION CORRECTION FOR INTERFEROMETRIC OR HOLOGRAPHIC METROLOGYEP2025/061441G03F 7/00ASML NETHERLANDS B.V.PHYSICSفیزیکابزارها
202548WO/2025/242396WAFER-LEVEL SELECTION FOR ENHANCED INLINE INSPECTION IN SEMICONDUCTOR MANUFACTURINGEP2025/061519G03F 7/00ASML NETHERLANDS B.V.PHYSICSفیزیکابزارها
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202548WO/2025/242414SUBSTRATE ALIGNMENT SYSTEMEP2025/061997G03F 9/00ASML NETHERLANDS B.V.PHYSICSفیزیکابزارها
202548WO/2025/242415SYSTEMS, METHODS, AND SOFTWARE FOR MODEL-BASED COMBINED ALIGNMENT AND OVERLAY METROLOGYEP2025/061998G03F 7/20ASML NETHERLANDS B.V.PHYSICSفیزیکابزارها
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202548WO/2025/243768RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERNJP2025/015752G03F 7/039TOKYO OHKA KOGYO CO., LTD.PHYSICSفیزیکابزارها
202548WO/2025/243876SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT DEVICEJP2025/017203G03F 7/32TOKYO ELECTRON LIMITEDPHYSICSفیزیکابزارها
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202548WO/2025/243956RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHODJP2025/017899G03F 7/004JSR CORPORATIONPHYSICSفیزیکابزارها
202548WO/2025/244102RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERNJP2025/018592G03F 7/004TOKYO OHKA KOGYO CO., LTD.PHYSICSفیزیکابزارها
202548WO/2025/244138SACRIFICIAL FILM-FORMING COMPOSITION AND METHOD FOR PRODUCING SACRIFICIAL FILM PATTERNJP2025/018817G03F 7/023OSAKA ORGANIC CHEMICAL INDUSTRY LTD.PHYSICSفیزیکابزارها
202548WO/2025/244887INSPECTION DEVICE WITH METASURFACE POLARIZATION BEAM SPLITTERUS2025/029234G03F 1/84CORNING INCORPORATEDPHYSICSفیزیکابزارها